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low-temperature CVD

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  • Chemical-mechanical planarization — Chemical Mechanical Polishing/Planarization is a process of smoothing surfaces with the combination of chemical and mechanical forces. It can be thought of as a hybrid of chemical etching and free abrasive polishing. Contents 1 Description 2… …   Wikipedia

  • Synthetic diamond — Synthetic diamonds of various colors grown by the high pressure high temperature technique Synthetic diamond is diamond produced in a technological process; as opposed to natural diamond, which is created in geological processes. Synthetic… …   Wikipedia

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

  • Copper indium gallium selenide solar cells — Copper indium gallium selenide (CuIn1 xGaxSe2 or CIGS) is a direct bandgap semiconductor useful for the manufacture of solar cells. Because the material strongly absorbs sunlight, a much thinner film is required than of other semiconductor… …   Wikipedia

  • crystal — crystallike, adj. /kris tl/, n., adj., v., crystaled, crystaling or (esp. Brit.) crystalled, crystalling. n. 1. a clear, transparent mineral or glass resembling ice. 2. the transparent form of crystallized quartz. 3. Chem., Mineral. a solid body… …   Universalium

  • Crystal — /kris tl/, n. 1. a city in SE Minnesota, near Minneapolis. 25,543. 2. a female given name. * * * I Any solid material whose atoms are arranged in a definite pattern and whose surface regularity reflects its internal symmetry. Each of a crystal s… …   Universalium

  • Ruthenium — (pronEng|ruːˈθiːniəm) is a chemical element that has the symbol Ru and atomic number 44. A rare transition metal of the platinum group of the periodic table, ruthenium is found associated with platinum ores and used as a catalyst in some platinum …   Wikipedia

  • Chemical vapor deposition of ruthenium — is a method to deposit thin layers of ruthenium on substrate by Chemical vapor deposition (CVD). A unique challenge arises in trying to grow impurity free films of a catalyst in Chemical vapor deposition (CVD). Ruthenium metal activates C H and C …   Wikipedia

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  • Ceramic matrix composite — Fracture surface of a fiber reinforced ceramic composed of SiC fibers and SiC matrix. The fiber pull out mechanism shown is the key to CMC properties …   Wikipedia

  • Depot chimique en phase vapeur — Dépôt chimique en phase vapeur Le dépôt chimique en phase vapeur (ou CVD pour l anglais chemical vapor deposition) est une méthode de dépôt de films minces, à partir de précurseurs gazeux. Sommaire 1 Principe 2 Variantes du dépôt chimique en… …   Wikipédia en Français

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